HIGH-TEMPERATURE OXIDATION RESISTANCE AND MICROSTRUCTURE OF THE OXIDE-FILMS IN SILICON-NITRIDE CERAMICS

被引：6
|
作者：
CASTRO, F
ECHEBERRIA, J
FUENTES, M
机构：
[1] Centro de Estudios e Investigaciones Técnicas (CEIT), Manuel de Lardizábal, San Sebastian, 20009
来源：
JOURNAL OF MATERIALS SCIENCE LETTERS | 1992年 / 11卷 / 02期
关键词：
D O I：
10.1007/BF00724612
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
[No abstract available]
引用
收藏
页码：101 / 105
页数：5
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