PHOTOCROSSLINKABLE POLYMERS BASED ON MALEIMIDE-MODIFIED ACRYLATES

Novel photocrosslinkable polymethacrylate systems with enhanced thermal stability and solvent resistance were synthesized. Copolymers of methyl methacrylate (MMA) or butyl acrylate (BuA) with 4-maleimido benzoic acid (MBA) were synthesized and photocrosslinkable methacrylic functions were incorporated through the pendent COOH groups. Photofunctional groups were introduced by the acid chloride route and by the epoxy-carboxy reaction. Photocrosslinking was performed using UV radiation of 350 nm in the presence of a photo-initiator. The kinetics of photocuring was studied with a model multiacrylate. The imide-modified photocured acrylate polymer exhibited enhanced solvent resistance and thermal stability, compared with the unmodified polymer.