CONTROL OF THE DEPOSITION TEMPERATURE BY THE USE OF A MAGNETIC-FIELD IN RF-SPUTTERING

被引：8
|
作者：
OUNADJELA, K
SURAN, G
SZTERN, J
机构：
来源：
THIN SOLID FILMS | 1987年 / 151卷 / 03期
关键词：
D O I：
10.1016/0040-6090(87)90138-6
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：397 / 402
页数：6
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