DIELECTRIC CHARACTERISTICS OF DOUBLE-LAYER STRUCTURE OF EXTREMELY THIN TA2O5/SIO2 ON SI

被引：72
|
作者：
NISHIOKA, Y
KIMURA, S
SHINRIKI, H
MUKAI, K
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 02期
关键词：
D O I：
10.1149/1.2100469
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：410 / 415
页数：6
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