RF METHOD FOR DETERMINING SHEATH THICKNESS IN A PLASMA

被引：5
|
作者：
BASU, J
SEN, C
机构：
来源：
PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS | 1967年 / 55卷 / 10期
关键词：
D O I：
10.1109/PROC.1967.5997
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
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页码：1767 / +
页数：1
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