RF METHOD FOR DETERMINING SHEATH THICKNESS IN A PLASMA

被引：5
|
作者：
BASU, J
SEN, C
机构：
来源：
PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS | 1967年 / 55卷 / 10期
关键词：
D O I：
10.1109/PROC.1967.5997
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：1767 / +
页数：1
相关论文
共 50 条
  • [1] RF PROPERTIES OF PLASMA SHEATH
    HARP, RS
    KINO, GS
    PAVKOVICH, J
    PHYSICAL REVIEW LETTERS, 1963, 11 (07) : 310 - &
  • [2] A METHOD FOR DETERMINING PLASMA SPACE POTENTIAL BY AN RF PROBE
    DOTE, T
    JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1969, 27 (06) : 1640 - &
  • [3] Levitation of Microorganisms in the Sheath of an RF Plasma
    Sanpei, Akio
    Kigami, Tomohito
    Kanaya, Hiroki
    Hayashi, Yasuaki
    Sampei, Mai
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2018, 46 (04) : 718 - 722
  • [4] ESTIMATE OF PLASMA VARACTOR SHEATH THICKNESS
    BRANDT, AA
    ZAKHAROV, VG
    TIKHOMIROV, YV
    VESTNIK MOSKOVSKOGO UNIVERSITETA SERIYA 3 FIZIKA ASTRONOMIYA, 1975, 16 (03): : 369 - 371
  • [5] PLASMA SHEATH THICKNESS IN RADIOFREQUENCY DISCHARGES
    MUTSUKURA, N
    KOBAYASHI, K
    MACHI, Y
    JOURNAL OF APPLIED PHYSICS, 1990, 68 (06) : 2657 - 2660
  • [6] PLASMAPAUSE AS A PLASMA SHEATH - MINIMUM THICKNESS
    ROTH, M
    JOURNAL OF ATMOSPHERIC AND TERRESTRIAL PHYSICS, 1976, 38 (11): : 1065 - 1070
  • [7] Theory of rf-driven plasma sheath
    Tskhakaya, D. D., Sr.
    Shukla, P. K.
    Eliasson, B.
    Kuhn, S.
    PHYSICA SCRIPTA, 2006, 74 (06) : 686 - 691
  • [8] Electrical characterization of a capacitive rf plasma sheath
    Gahan, D.
    Hopkins, M. B.
    REVIEW OF SCIENTIFIC INSTRUMENTS, 2007, 78 (01):
  • [9] PARTICLE SIMULATION OF THE MAGNETIZED RF PLASMA SHEATH
    PAES, ACJ
    SYDORA, RD
    DAWSON, JM
    PHYSICS OF FLUIDS B-PLASMA PHYSICS, 1992, 4 (09): : 2699 - 2704
  • [10] RF plasma sheath in an oblique magnetic field
    Liu, Jin-Yuan
    Zhao, Fei
    Zou, Xiu
    Zhang, Yu
    Liu, Yue
    Wang, Xiao-Gang
    VACUUM, 2006, 80 (11-12) : 1206 - 1210
12345