PROCESS EMISSIONS MONITORING AND CONTROL

被引：1
|
作者：
BERNSON, LS
HOPKINS, EW
LLOYD, JL
OBERC, LW
SAMINATHAN, M
STEELE, DB
THOMPSON, MK
WOLK, GL
机构：
[1] AT&T BELL LABS,ENGN RES CTR,DEPT ENVIRONM & MAT TECHNOL,TECH STAFF,PRINCETON,NJ
[2] AT&T,DEPT ENVIRONM HLTH & SAFETY,MONTGOMERY WORKS,MONTGOMERY,IL
[3] AT&T,PRINTED CIRCUIT HEADQUARTERS,DEPT ENVIRONM HLTH & SAFETY,TECH STAFF,RICHMOND,VA
来源：
AT&T TECHNICAL JOURNAL | 1992年 / 71卷 / 02期
关键词：
D O I：
10.1002/j.1538-7305.1992.tb00155.x
中图分类号：
TP3 [计算技术、计算机技术];
学科分类号：
0812 ;
摘要：
Some manufacturing, research, and development conducted within AT & T involves processes that emit air contaminants. These emissions are confined, scrubbed to recover the constituents, and vented outside through stacks. Continuous emission monitoring (CEM) systems analyze the emissions in near-real time and provide feedback to control them. The information collected from CEM systems in some industries is used to prove compliance with applicable environmental regulations. This paper describes CEM technology and an Environmental Monitoring and Reporting System (EMARS) for near-real-time emissions monitoring. It also presents selected applications in AT & T Bell Laboratories and AT & T manufacturing facilities at Montgomery and Richmond.
引用
收藏
页码：29 / 36
页数：8
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