ANNEAL BEHAVIOR OF ALUMINUM-IMPLANTED GERMANIUM

被引：7
|
作者：
ITOH, T
OHDOMARI, I
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 1971年 / 10卷 / 08期
关键词：
D O I：
10.1143/JJAP.10.1002
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：1002 / &
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