HYDRA E-BEAM MACHINE

被引：0
|
作者：
MARTIN, TH [1 ]
机构：
[1] SANDIA LABS,ALBURQUERQUE,NM
来源：
BULLETIN OF THE AMERICAN PHYSICAL SOCIETY | 1973年 / 18卷 / 02期
关键词：
D O I：
暂无
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
收藏
页码：194 / 194
页数：1
相关论文
共 50 条
  • [1] Distributed processing (DP) based e-beam lithography simulation with long range correction algorithm in e-beam machine
    Ki, Won-Tai
    Choi, Ji-Hyeon
    Kim, Byung-Gook
    Woo, Sang-Gyun
    Cho, Han-Ku
    [J]. PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XV, PTS 1 AND 2, 2008, 7028
  • [2] Dispenser cathodes for e-beam lithography machine: a quick take
    Katsap, Victor
    Lai, Chising
    [J]. 2017 EIGHTEENTH INTERNATIONAL VACUUM ELECTRONICS CONFERENCE (IVEC), 2017,
  • [3] E-beam technology
    Knowles, G
    [J]. PHOTONICS SPECTRA, 2000, 34 (10) : 12 - 13
  • [4] Analysis of e-beam impact on the resist stack in e-beam lithography process
    Indykiewicz, K.
    Paszkiewicz, B.
    [J]. ELECTRON TECHNOLOGY CONFERENCE 2013, 2013, 8902
  • [5] FAST E-BEAM MACHINE WRITES 0.5-MUM LINES
    MARSHALL, M
    [J]. ELECTRONICS, 1981, 54 (12): : 38 - 38
  • [6] Machine Specific Fracture Optimization for JEOL E-Beam Mask Writer
    Yeap, Johnny
    Kondepudy, Raghava
    Kulkarni, Parikshit
    Kawase, Yuichi
    Cinque, Russell
    [J]. PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XVII, 2010, 7748
  • [7] E-BEAM SYSTEM METROLOGY
    SILLS, RM
    STANDIFORD, KP
    [J]. SOLID STATE TECHNOLOGY, 1983, 26 (09) : 191 - 196
  • [8] Illuminating E-Beam Processing
    McHugh, Tara
    Carswell, Lindsay
    [J]. FOOD TECHNOLOGY, 2017, 71 (01) : 64 - 66
  • [9] E-BEAM FUSION DIAGNOSTICS
    TOEPFER, AJ
    [J]. LASER FOCUS WITH FIBEROPTIC TECHNOLOGY, 1979, 15 (01): : 8 - 8
  • [10] SUBMICRON E-BEAM TESTING
    WOLFGANG, E
    GORLICH, S
    KOLZER, J
    [J]. INSTITUTE OF PHYSICS CONFERENCE SERIES, 1989, (100): : 689 - 696
12345