DEPOSITION AND PROPERTIES OF MOS2 THIN-FILMS GROWN BY PULSED LASER EVAPORATION

被引：57
|
作者：
DONLEY, MS
MURRAY, PT
BARBER, SA
HAAS, TW
机构：
[1] UNIV DAYTON,RES INST,DAYTON,OH 45469
[2] BATTELLE MEM INST,COLUMBUS,OH 43201
来源：
SURFACE & COATINGS TECHNOLOGY | 1988年 / 36卷 / 1-2期
关键词：
D O I：
10.1016/0257-8972(88)90163-6
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
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页码：329 / 340
页数：12
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