SENSITIVE TECHNIQUE FOR STUDYING ION-IMPLANTATION DAMAGE

被引：83
|
作者：
EERNISSE, EP
机构：
来源：
APPLIED PHYSICS LETTERS | 1971年 / 18卷 / 12期
关键词：
D O I：
10.1063/1.1653549
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：581 / &
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