FREQUENCY-DEPENDENT DIELECTRIC BEHAVIOR OF AMORPHOUS SILICON THIN-FILMS

被引：20
|
作者：
RIEDER, G [1 ]
机构：
[1] VIENNA TECH UNIV,INST HOCHFREQUENZTECH,A-1040 VIENNA,AUSTRIA
来源：
PHYSICAL REVIEW B | 1979年 / 20卷 / 02期
关键词：
D O I：
10.1103/PhysRevB.20.607
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：607 / 615
页数：9
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