FREQUENCY-DEPENDENT DIELECTRIC BEHAVIOR OF AMORPHOUS SILICON THIN-FILMS

被引：20
|
作者：
RIEDER, G [1 ]
机构：
[1] VIENNA TECH UNIV,INST HOCHFREQUENZTECH,A-1040 VIENNA,AUSTRIA
来源：
PHYSICAL REVIEW B | 1979年 / 20卷 / 02期
关键词：
D O I：
10.1103/PhysRevB.20.607
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：607 / 615
页数：9
相关论文
共 50 条
  • [1] FREQUENCY-DEPENDENT CONDUCTIVITY IN SPUTTERED AMORPHOUS PHOSPHORUS THIN-FILMS
    EXTANCE, P
    ELLIOTT, SR
    DAVIS, EA
    PHYSICAL REVIEW B, 1985, 32 (12): : 8148 - 8161
  • [2] FREQUENCY-DEPENDENT CONDUCTIVITY AND CAPACITANCE IN CHALCOGENIDE THIN-FILMS
    SUNTOLA, T
    TIAINEN, OJA
    VALKIAINEN, M
    THIN SOLID FILMS, 1972, 12 (02) : 227 - +
  • [3] Frequency-dependent dielectric breakdown in thin polyvinylcarbazole films
    Miyairi, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2003, 42 (08): : 5153 - 5157
  • [4] Frequency-Dependent Dielectric Breakdown in Thin Polyvinylcarbazole Films
    Miyairi, K., 1600, Japan Society of Applied Physics (42):
  • [5] DIELECTRIC BEHAVIOR OF AMORPHOUS INDIUM OXIDE THIN-FILMS
    BALASUBRAMANIAN, A
    RADHAKRISHNAN, M
    BALASUBRAMANIAN, C
    THIN SOLID FILMS, 1990, 193 (1-2) : 981 - 989
  • [6] FREQUENCY-DEPENDENT CONDUCTIVITY IN EVAPORATED AMORPHOUS-SILICON FILMS
    CIL, CZ
    AKTAS, G
    THIN SOLID FILMS, 1991, 196 (02) : 179 - 191
  • [7] Frequency-dependent dielectric coefficients of TlInS2 amorphous films
    Mustafaeva, S. N.
    Asadov, M. M.
    Qahramanov, K. Sh.
    SEMICONDUCTOR PHYSICS QUANTUM ELECTRONICS & OPTOELECTRONICS, 2007, 10 (02) : 58 - 61
  • [8] Frequency-dependent conductive behavior of polymer-derived amorphous silicon carbonitride
    Ma, Baisheng
    Wang, Yiguang
    Wang, Kewei
    Li, Xuqin
    Liu, Jinling
    An, Linan
    ACTA MATERIALIA, 2015, 89 : 215 - 224
  • [9] High-voltage Photonic Switching of Dielectric Elastomers with Amorphous Silicon Thin-Films
    Gillespie, C.
    Marzo, A.
    Scarpa, F.
    Rossiter, J.
    Conn, A. T.
    ELECTROACTIVE POLYMER ACTUATORS AND DEVICES (EAPAD) XXI, 2019, 10966
  • [10] TEM INSITU INVESTIGATIONS OF THE CRYSTALLIZATION BEHAVIOR OF AMORPHOUS-SILICON THIN-FILMS
    REICHE, M
    HOPFE, S
    ULTRAMICROSCOPY, 1990, 33 (01) : 41 - 50
12345