CHARGE-DENSITY TRANSFER OF H-ADSORPTION ON THE SI(111) (1X1) SURFACE

被引:2
|
作者
WU, BR
CHENG, C
机构
[1] Department of Physics, National Cheng Kung University, Tainan
来源
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D O I
10.1002/pssb.2221860112
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The charge-density transfers from ab initio quantum mechanical calculations for the adsorption of hydrogen atoms on the Si(111) (1 x 1) surface are presented. In the initial stages of the adsorption, the interaction occurs between the hydrogen atom and the surface dangling bond or between the hydrogen atom and the hydrogen overlayer. The interaction has the same characteristics as the initial stages of the hydrogen molecule formation. For the adsorbed systems, the charge-density transfers exhibit strong ionicity with the adsorbed hydrogen atoms being the more electronegative ones. The hydrogen atoms are negatively charged beneath the Si(111) (1 x 1) surface. This property is retained for the hydrogen atoms in the silicon bulk, no matter whether the system is neutral or charged.
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页码:143 / 157
页数:15
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