DEPENDENCE OF SEGREGATED MICROSTRUCTURE IN SPUTTER-DEPOSITED COCR FILM ON DEPOSITION CONDITIONS

被引:18
|
作者
MASUYA, H [1 ]
AWANO, H [1 ]
机构
[1] SONY CORP,INFORMAT SYST RES CTR,YOKOHAMA,KANAGAWA 240,JAPAN
关键词
D O I
10.1109/TMAG.1987.1065612
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:2064 / 2066
页数:3
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