CREATING AND USING EQUIPMENT MODELS IN SEMICONDUCTOR MANUFACTURING

被引：0
|
作者：
SPANOS, CJ
机构：
[1] Department of Electrical Engineering and Computer Sciences, University of California, Berkeley
来源：
MICROELECTRONIC ENGINEERING | 1991年 / 10卷 / 3-4期
关键词：
EQUIPMENT SPECIFIC PROCESS MODELS; RECIPE GENERATION; CONTROL; FAULT DIAGNOSIS; PROFILE INTERCHANGE FORMAT; EVIDENTIAL REASONING; AGING; COMPUTER AIDED MANUFACTURING; STATISTICAL PROCESS CONTROL; REAL TIME MONITORING; MAINTENANCE RECORD KEEPING;
D O I：
10.1016/0167-9317(91)90022-6
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
As integrated circuit cost and performance specifications grow more demanding, several aspects of classical manufacturing science are finding their way into the cleanroom. This presentation focuses on the definition, development and application of production worthy equipment models. The concepts of model development and characterization are illustrated with examples drawn from modeling low pressure chemical vapor deposition (LPCVD), plasma etch and lithography. Applications in recipe generation and model-based control and diagnosis are also discussed.
引用
收藏
页码：199 / 205
页数：7
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