SPECTROSCOPIC CHARACTERIZATION OF A CH4 PLUS CO2 PLASMA OBTAINED BY DIELECTRIC BARRIER DISCHARGE

被引:0
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作者
MOTRET, O
MASSEREAU, V
NIKRAVECH, M
HILBERT, C
POUVESLE, JM
CHAPELLE, J
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10.1051/anphys/1994033
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Plasma processing of CH4+CO2 mixture can lead to the formation of synthesis gas (CO+H-2). The use of cold plasma for this type of process seems very promissing. We report here the determination of vibrational and rotational temperature in several gases (CH4, CH4+CO2) at atmospheric pressure. The plasma is created by high voltage (90 kV), fast pulse (20 ns) Dielectric Barrier Discharge in tubular cell. The measured average rotational temperature is very low T-rot approximate to 650 K; on the other hand the vibrational temperature is high T-vib approximate to 5500 K and may explain the good chemical plasma reactivity.
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页码:157 / 158
页数:2
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