FEATURES OF DEEP LOCAL ETCHING OF SILICON STRUCTURES IN HF HNO3 CH3COOH COMPOSITIONS

被引:0
|
作者
IZIDINOV, SO
GAPONENKO, VI
机构
来源
JOURNAL OF APPLIED CHEMISTRY OF THE USSR | 1990年 / 63卷 / 06期
关键词
D O I
暂无
中图分类号
O69 [应用化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:1160 / 1164
页数:5
相关论文
共 50 条
  • [21] Mass and Electron Balance for the Oxidation of Silicon during the Wet Chemical Etching in HF/HNO3 Mixtures
    Acker, Joerg
    Rietig, Anja
    Steinert, Marco
    Hoffmann, Volker
    JOURNAL OF PHYSICAL CHEMISTRY C, 2012, 116 (38): : 20380 - 20388
  • [22] CONTROLLED ETCHING OF SILICON IN THE HF-HNO3 SYSTEM
    KLEIN, DL
    DSTEFAN, DJ
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1962, 109 (01) : 37 - 42
  • [23] MACROKINETICS OF ABSORPTION OF HF, F2, HCL, AND CH3COOH BY WATER
    BROUNSHTEIN, BI
    KOCHETOV, OA
    SIMAKOVA, IV
    SKALABAN, AV
    RUSSIAN JOURNAL OF APPLIED CHEMISTRY, 1994, 67 (01) : 63 - 67
  • [24] Effect of CH3COOH on Hydrometallurgical Purification of Metallurgical-Grade Silicon Using HCl-HF Leaching
    Chunjin Tian
    Haifei Lu
    Kuixian Wei
    Wenhui Ma
    Keqiang Xie
    Jijun Wu
    Yun Lei
    Bin Yang
    Kazuki Morita
    JOM, 2018, 70 : 527 - 532
  • [25] Effect of CH3COOH on Hydrometallurgical Purification of Metallurgical-Grade Silicon Using HCl-HF Leaching
    Tian, Chunjin
    Lu, Haifei
    Wei, Kuixian
    Ma, Wenhui
    Xie, Keqiang
    Wu, Jijun
    Lei, Yun
    Yang, Bin
    Morita, Kazuki
    JOM, 2018, 70 (04) : 527 - 532
  • [26] Effect of HF and HNO3 Concentration on Etching Rate of Each Component in Waste Crystalline Silicon Solar Cells
    Takami, Kei
    Kobashi, Masatoshi
    Shiraga, Yuki
    Uddin, Md. Azhar
    Kato, Yoshiei
    Wu, Shengji
    MATERIALS TRANSACTIONS, 2015, 56 (12) : 2047 - 2052
  • [27] Unveiling the shape-diversified silicon nanowires made by HF/HNO3 isotropic etching with the assistance of silver
    Chen, Chia-Yun
    Wong, Ching-Ping
    NANOSCALE, 2015, 7 (03) : 1216 - 1223
  • [28] Room-Temperature Wet Etching of Polycrystalline and Nanocrystalline Silicon Carbide Thin Films with HF and HNO3
    Roper, Christopher S.
    Howe, Roger T.
    Maboudian, Roya
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2009, 156 (03) : D104 - D107
  • [29] Scanning probe-based nanolithography: nondestructive structures fabricated on silicon surface via distinctive anisotropic etching in HF/HNO3 mixtures
    Lei Wu
    Pei Zhang
    Chengqiang Feng
    Jian Gao
    Bingjun Yu
    Linmao Qian
    Journal of Materials Science, 2021, 56 : 3887 - 3899
  • [30] Scanning probe-based nanolithography: nondestructive structures fabricated on silicon surface via distinctive anisotropic etching in HF/HNO3 mixtures
    Wu, Lei
    Zhang, Pei
    Feng, Chengqiang
    Gao, Jian
    Yu, Bingjun
    Qian, Linmao
    JOURNAL OF MATERIALS SCIENCE, 2021, 56 (05) : 3887 - 3899