DYNAMIC WETTING BEHAVIOR OF SILICON-WAFERS IN ALKALINE-SOLUTIONS OF INTEREST TO SEMICONDUCTOR PROCESSING

被引：0

作者：

PARK, JG ^{[1
]}

RAGHAVAN, S ^{[1
]}

机构：

[1] UNIV ARIZONA,ARIZONA MAT LABS,DEPT MAT SCI & ENGN,TUCSON,AZ 85721

来源：

ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1992年 / 203卷

关键词：

D O I：

暂无

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：131 / COLL

共 50 条

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