MECHANISM OF CLUSTER FORMATION IN A CLEAN SILANE DISCHARGE

被引：38
|
作者：
VEPREK, S
SCHOPPER, K
AMBACHER, O
RIEGER, W
VEPREKHEIJMAN, MGJ
机构：
[1] Institute for Chemistry of Information Recording, Technical University Munich
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1993年 / 140卷 / 07期
关键词：
D O I：
10.1149/1.2220742
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
The mechanism of the formation of hydrogenated silicon clusters in a clean silane glow discharge is studied with elastic light scattering. The data are complemented by mass spectrometric measurements and theoretical modeling. In a clean discharge with a maximum oxygen and water content of <0.1 mole percent (m/o) the appearance of the clusters correlates with the formation of higher polysilanes. A possible mechanism of the cluster formation is suggested.
引用
收藏
页码：1935 / 1942
页数：8
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