X-RAY ANALYSIS OF TANTALUM FILMS TRIODE-SPUTTERED IN ARGON-OXYGEN MIXTURES

被引：19

作者：

WESTWOOD, WD ^{[1
]}

机构：

[1] BELL TEL CO INC,NO RES,OTTAWA,ONTARIO,CANADA

来源：

THIN SOLID FILMS | 1973年 / 15卷 / 01期

关键词：

D O I：

10.1016/0040-6090(73)90200-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：15 / 30

页数：16

共 50 条

[1] TANTALUM FILMS TRIODE-SPUTTERED IN MIXTURES OF ARGON AND WATER VAPOR
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[2] TANTALUM FILM RESISTORS SPUTTERED IN ARGON-OXYGEN MIXTURES
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[4] EFFECT OF NITROGEN ON THE ELECTRICAL AND STRUCTURAL PROPERTIES OF TRIODE-SPUTTERED TANTALUM FILMS.
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[6] TANTALUM FILMS TRIODE SPUTTERED IN LOW-PRESSURE MIXTURES OF ARGON AND WATER VAPOR
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[7] PROPERTIES OF NICKEL FERRITE FILMS DC-SPUTTERED IN ARGON-OXYGEN MIXTURES
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[8] STRUCTURAL AND ELECTRICAL PROPERTIES OF FILMS SPUTTERED FROM A PT CATHODE IN ARGON-OXYGEN MIXTURES
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[9] STRUCTURAL AND ELECTRICAL PROPERTIES OF TANTALUM FILMS SPUTTERED IN OXYGEN-ARGON MIXTURES
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[10] X-RAY ANALYSIS OF SPUTTERED FILMS OF BETA-TANTALUM AND BODY-CENTERED CUBIC TANTALUM
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