TECHNICAL AND REGULATORY REQUIREMENTS FOR RADIATION STERILIZATION FACILITIES USING ELECTRON-BEAM ACCELERATORS

被引:0
|
作者
SAYLOR, MC
PARKS, LA
HERRING, CH
机构
[1] IRT CORP,SAN DIEGO,CA 92121
[2] ETHICON ENDO SURG,CINCINNATI,OH 45242
来源
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1993年 / 79卷 / 1-4期
关键词
D O I
10.1016/0168-583X(93)95489-R
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Various technical and regulatory considerations must be addressed in order to sterilize disposable medical devices by ionizing radiation. Current practices specific to electron beam-based sterilization events are discussed and include material compatibility testing, dose setting, dose mapping, process validation and process control associated with the accelerator/conveyor system. Projected trends in regulatory guideline development are made relative to the appearance and implementation of reliable high power machine-generated sources of electrons operating in the energy range of 0.3-12 MeV.
引用
收藏
页码:875 / 878
页数:4
相关论文
共 50 条
  • [31] NEW APPLICATIONS OF LOW-VOLTAGE ELECTRON-BEAM ACCELERATORS
    HOLL, P
    FOLL, E
    RADIATION PHYSICS AND CHEMISTRY, 1990, 35 (4-6): : 653 - 657
  • [32] HIGH-VOLTAGE ELECTRON-BEAM IRRADIATION FACILITIES
    CLELAND, MR
    RADIATION PHYSICS AND CHEMISTRY, 1981, 18 (1-2): : 301 - 312
  • [33] A FULLY INTEGRATED 10 MEV ELECTRON-BEAM STERILIZATION SYSTEM
    ALLEN, JT
    CALHOUN, R
    HELM, J
    KRUGER, S
    LEE, C
    MENDONSA, R
    MEYER, S
    PAGEAU, G
    SHAFFER, H
    WHITHAM, K
    WILLIAMS, CB
    FARRELL, JP
    RADIATION PHYSICS AND CHEMISTRY, 1995, 46 (4-6) : 457 - 460
  • [34] COMPARISON OF CO-60 AND ELECTRON-ACCELERATORS FOR RADIATION STERILIZATION
    DUNN, TS
    WILLIAMS, JL
    IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1979, 26 (01) : 1776 - 1783
  • [35] COMPARISON OF CO-60 AND ELECTRON-ACCELERATORS FOR RADIATION STERILIZATION
    DUNN, TS
    WILLIAMS, JL
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1978, 23 (08): : 1043 - 1043
  • [36] Resist requirements and limitations for nanoscale electron-beam patterning
    Liddle, JA
    Gallatin, GM
    Ocola, LE
    THREE-DIMENSIONAL NANOENGINEERED ASSEMBLIES, 2003, 739 : 19 - 30
  • [37] Electron-beam lithography: Resist requirements and performance.
    Liddle, JA
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2001, 222 : U248 - U248
  • [38] OPTICAL AND ELECTRON-BEAM REQUIREMENTS FOR AN OPTICAL UNDULATOR FEL
    TSUNAWAKI, Y
    AMIR, A
    GALLARDO, JC
    ELIAS, LR
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1988, 27 (04): : 675 - 678
  • [39] ELECTRON-BEAM DOSIMETRY USING RADIATION-INDUCED FLUORESCENCE OF POLYETHYLENE
    RADOVSKY, DA
    BRUMBERG.H
    NATURE, 1967, 216 (5114) : 469 - &
  • [40] ELECTRON-BEAM DIAGNOSTICS FOR AN FEL USING OPTICAL-TRANSITION RADIATION
    NISHIMURA, E
    SAEKI, K
    TOMIMASU, T
    SAKAI, T
    OKUDA, S
    OHKUMA, J
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 1995, 358 (1-3): : ABS89 - ABS90