SURFACE-CHARGE PROPERTIES OF FLUORINE-DOPED LEAD BOROSILICATE GLASS

被引:5
|
作者
SHIMBO, M [1 ]
FURUKAWA, K [1 ]
TANZAWA, K [1 ]
HIGUCHI, T [1 ]
机构
[1] TOSHIBA CORP,TOSHIBA RES & DEV CTR,SAIWAI KU,KAWASAKI 210,JAPAN
关键词
CAPACITORS - Measurements - GLASS - Materials - SEMICONDUCTING SILICON - Doping;
D O I
10.1109/16.2427
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Surface-charge configurations, together with stability under bias-temperature (BT) stress, for F-doped and Na-doped lead borosilicate glass were investigated by using C-V and I-V measurements on metal-glass-silicon capacitors and on diodes passivated with the glass. The C-V characteristics showed an increase in negative charge for F doping and in positive charge for Na doping. Alkali impurities in the glass mainly controlled the surface-charge shift during BT, but additional changes, similar to those for Na doping but reversing the sign of the charge, took place by F doping. The leakage current decrease in the diode passivated with F-doped glass, which contradicts the results of C-V measurement, may be due to the reduction of the generation current by the interaction between the silicon surface and F**- ions.
引用
收藏
页码:124 / 128
页数:5
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