SURFACE-CHARGE PROPERTIES OF FLUORINE-DOPED LEAD BOROSILICATE GLASS

被引:5
|
作者
SHIMBO, M [1 ]
FURUKAWA, K [1 ]
TANZAWA, K [1 ]
HIGUCHI, T [1 ]
机构
[1] TOSHIBA CORP,TOSHIBA RES & DEV CTR,SAIWAI KU,KAWASAKI 210,JAPAN
关键词
CAPACITORS - Measurements - GLASS - Materials - SEMICONDUCTING SILICON - Doping;
D O I
10.1109/16.2427
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Surface-charge configurations, together with stability under bias-temperature (BT) stress, for F-doped and Na-doped lead borosilicate glass were investigated by using C-V and I-V measurements on metal-glass-silicon capacitors and on diodes passivated with the glass. The C-V characteristics showed an increase in negative charge for F doping and in positive charge for Na doping. Alkali impurities in the glass mainly controlled the surface-charge shift during BT, but additional changes, similar to those for Na doping but reversing the sign of the charge, took place by F doping. The leakage current decrease in the diode passivated with F-doped glass, which contradicts the results of C-V measurement, may be due to the reduction of the generation current by the interaction between the silicon surface and F**- ions.
引用
收藏
页码:124 / 128
页数:5
相关论文
共 50 条
  • [1] SURFACE-CHARGE STUDIES ON LEAD BOROSILICATE GLASS CONTAINING TRACE SODIUM
    SHIMBO, M
    FURUKAWA, K
    TANZAWA, K
    FUKADA, K
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (01) : 156 - 160
  • [2] SURFACE-CHARGE IN A ZINC-BOROSILICATE GLASS-SILICON SYSTEM
    MISAWA, Y
    HACHINO, H
    HARA, S
    OGAWA, T
    YAGI, H
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (03) : C142 - C142
  • [3] Electrodeposition of fluorine-doped lead dioxide
    Velichenko, A. B.
    Devilliers, D.
    JOURNAL OF FLUORINE CHEMISTRY, 2007, 128 (04) : 269 - 276
  • [4] Properties of fluorine-doped ZnO deposited onto glass by spray pyrolysis
    Sanchez-Juarez, A
    Tiburcio-Silver, A
    Ortiz, A
    SOLAR ENERGY MATERIALS AND SOLAR CELLS, 1998, 52 (3-4) : 301 - 311
  • [5] Rayleigh scattering in fluorine-doped silica glass
    Kakiuchida, H
    Saito, K
    Ikushima, AJ
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2003, 42 (10): : 6516 - 6517
  • [6] Rayleigh Scattering in Fluorine-Doped Silica Glass
    Kakiuchida, H. (d5skaki@toyota-ti.ac.jp), 1600, Japan Society of Applied Physics (42):
  • [7] Rayleigh scattering in fluorine-doped silica glass
    Kakiuchida, IF
    Saito, K
    Ikushima, AJ
    APOC 2002: ASIA-PACIFIC OPTICAL AND WIRELESS COMMUNICATIONS; MATERIALS AND DEVICES FOR OPTICAL AND WIRELESS COMMUNICATIONS, 2002, 4905 : 355 - 362
  • [8] Properties and production of fluorine-doped silica.
    Smith, CM
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2002, 224 : U546 - U546
  • [9] Investigation on the magnetic and electrical properties of fluorine-doped magnetites
    Gao, Lei
    Li, Ran
    Chen, Qianwang
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2012, 45 (33)
  • [10] Preparation and adsorption properties of fluorine-doped porous polymers
    Zhao H.
    Chen G.
    Peng Q.
    Wang R.
    Cao X.
    Liu H.
    Liu Q.
    Fuhe Cailiao Xuebao/Acta Materiae Compositae Sinica, 2022, 39 (08): : 3733 - 3746