ON ENERGY EQUILIBRIUM OF ARC DISCHARGES OF OXYDE CATHODES

被引:0
|
作者
BITO, J
机构
来源
关键词
D O I
暂无
中图分类号
P3 [地球物理学]; P59 [地球化学];
学科分类号
0708 ; 070902 ;
摘要
引用
收藏
页码:409 / &
相关论文
共 50 条
  • [31] Cathode sputtering in arc discharges
    Koller, Lewis R.
    PHYSICS-A JOURNAL OF GENERAL AND APPLIED PHYSICS, 1936, 7 (01): : 225 - 231
  • [32] THE EMISSION FROM HOT CATHODES IN GAS DISCHARGES
    PENGELLY, AE
    WRIGHT, DA
    BRITISH JOURNAL OF APPLIED PHYSICS, 1954, 5 (NOV): : 391 - 395
  • [33] Fluctuation of arc plasma in arc plasma torch with multiple cathodes
    张泽龙
    王城
    孙强
    夏维东
    Chinese Physics B, 2019, 28 (09) : 286 - 291
  • [34] INVESTIGATION OF ARC STARTING ON COLD CATHODES
    WITTING, HL
    JOURNAL DE PHYSIQUE, 1979, 40 : 451 - 452
  • [35] ARC EVAPORATION OF MULTICOMPONENT MCRALY CATHODES
    KNOTEK, O
    LUGSCHEIDER, E
    LOFFLER, F
    BEELE, W
    BARIMANI, C
    SURFACE & COATINGS TECHNOLOGY, 1995, 74-5 (1-3): : 118 - 122
  • [36] Fluctuation of arc plasma in arc plasma torch with multiple cathodes
    Zhang, Zelong
    Wang, Cheng
    Sun, Qiang
    Xia, Weidong
    CHINESE PHYSICS B, 2019, 28 (09)
  • [37] Long-lived laser-induced arc discharges for energy channeling applications
    Point, Guillaume
    Arantchouk, Leonid
    Thouin, Emmanuelle
    Carbonnel, Jerome
    Mysyrowicz, Andre
    Houard, Aurelien
    SCIENTIFIC REPORTS, 2017, 7
  • [38] Ion energy distributions in reactive arc evaporation discharges used for deposition of TiN films
    Ivanov, I.
    Ljungcrantz, H.
    Hakansson, G.
    Petrov, I.
    Sundgren, J.-E.
    Surface and Coatings Technology, 1997, 92 (1-2): : 150 - 156
  • [39] Ion energy distributions in reactive arc evaporation discharges used for deposition of TiN films
    Ivanov, I
    Ljungcrantz, H
    Hakansson, G
    Petrov, I
    Sundgren, JE
    SURFACE & COATINGS TECHNOLOGY, 1997, 92 (1-2): : 150 - 156
  • [40] Axisymmetric jet shear-layer excitation by laser energy and electric arc discharges
    Adelgren, RG
    Elliott, GS
    Crawford, JB
    AIAA JOURNAL, 2005, 43 (04) : 776 - 791