ETCHING OF SI THROUGH SIO2 IN CF4/N2O PLASMA

被引：0
|
作者：
WANG, XW
LIU, MD
MA, TP
BARKER, RC
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1988年 / 135卷 / 02期
关键词：
D O I：
10.1149/1.2095634
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：442 / 445
页数：4
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