DETERMINATION OF DIFFERENT ORIENTATIONS IN EPITAXIAL SILICIDE LAYERS USING X-RAY-DIFFRACTION

被引:2
|
作者
VANDERSTRAETEN, H [1 ]
BRUYNSERAEDE, Y [1 ]
WU, MF [1 ]
VANTOMME, A [1 ]
LANGOUCHE, G [1 ]
机构
[1] KATHOLIEKE UNIV LEUVEN,INST KERN STRALINGSFYS,B-3001 LOUVAIN,BELGIUM
关键词
D O I
10.1088/0022-3727/24/6/019
中图分类号
O59 [应用物理学];
学科分类号
摘要
Heteroepitaxial CoSi2 layers have been formed by high-dose ion beam synthesis and solid phase epitaxy on Si<111> substrates. X-ray rocking curve measurements allow a very precise determination of the relative amounts of aligned (type A) and twinned (type B) CoSi2. A simple procedure yields the separation of the asymmetric reflections of the (331) planes of type A or type B Si and CoSi2. The intensity ratio of the (331) reflection of type A and type B CoSi2 corresponds to the relative amounts of type A and type B CoSi2.
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页码:937 / 941
页数:5
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