EFFECT OF OXYGEN ON RF-SPUTTERING RATE OF SIO2

被引：63
|
作者：
JONES, RE
WINTERS, HF
MAISSEL, LI
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1968年 / 5卷 / 03期
关键词：
D O I：
10.1116/1.1492586
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：84 / &
相关论文
共 50 条
  • [1] AMORPHOUS GE/SIO2 SUPERLATTICES PREPARED BY RF-SPUTTERING
    CUI, JZ
    CHEN, GG
    ZHANG, XW
    [J]. PHYSICA STATUS SOLIDI B-BASIC RESEARCH, 1995, 189 (01): : K9 - K11
  • [2] CUCL MICROCRYSTALLITE-DOPED SIO2 GLASS THIN-FILMS PREPARED BY RF-SPUTTERING
    TSUNETOMO, K
    SHIMIZU, R
    KAWABUCHI, A
    KITAYAMA, H
    OSAKA, Y
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1991, 30 (4B): : L764 - L767
  • [3] Semiconducting CdTe microcrystalline-doped SiO2 glass thin films prepared by Rf-sputtering
    [J]. Nasu, Hiroyuki, 1600, (28):
  • [4] MAGNETOOPTICAL PROPERTIES OF CD1-XMNXSE MICROCRYSTALLITES IN SIO2 GLASS PREPARED BY RF-SPUTTERING
    YANATA, K
    SUZUKI, K
    OKA, Y
    [J]. JOURNAL OF APPLIED PHYSICS, 1993, 73 (09) : 4595 - 4598
  • [5] EFFECT OF TRACES OF OXYGEN UPON DEPOSITION RATE OF RF-SPUTTERED SIO2
    JONES, RE
    WINTERS, HA
    MAISSEL, LI
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1967, 4 (05): : 338 - &
  • [6] Quantum size effect of ZnSe microcrystal-doped SiO2 glass thin films prepared by RF-sputtering method
    Hayashi, M
    Iwano, T
    Nasu, H
    Kamiya, K
    Sugimoto, N
    Hirao, K
    [J]. JOURNAL OF MATERIALS RESEARCH, 1997, 12 (10) : 2552 - 2558
  • [7] Quantum size effect of ZnSe microcrystal-doped SiO2 glass thin films prepared by RF-sputtering method
    Masayuki Hayashi
    Takafumi Iwano
    Hiroyuki Nasu
    Kanichi Kamiya
    Naoki Sugimoto
    Kazuyuki Hirao
    [J]. Journal of Materials Research, 1997, 12 : 2552 - 2558
  • [8] THE INFLUENCE OF OXYGEN ON SIO2 SPUTTERING
    HOLMEN, G
    JACOBSSON, H
    [J]. JOURNAL OF APPLIED PHYSICS, 1990, 68 (06) : 2962 - 2965
  • [9] Effect of oxygen on the properties of CdSe thin films prepared by RF-sputtering
    Wu, Qiuchen
    Lin, Xinlu
    Mahabaduge, Hasitha
    Liu, Xiangxin
    Zhang, Yufeng
    [J]. CHEMICAL PHYSICS LETTERS, 2022, 799
  • [10] SEMICONDUCTING CDTE MICROCRYSTALLINE-DOPED SIO2 GLASS THIN-FILMS PREPARED BY RF-SPUTTERING
    NASU, H
    TSUNETOMO, K
    TOKUMITSU, Y
    OSAKA, Y
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1989, 28 (05): : L862 - L864
12345