SEMICONDUCTING CDTE MICROCRYSTALLINE-DOPED SIO2 GLASS THIN-FILMS PREPARED BY RF-SPUTTERING

被引：48
|
作者：
NASU, H [1 ]
TSUNETOMO, K [1 ]
TOKUMITSU, Y [1 ]
OSAKA, Y [1 ]
机构：
[1] HIROSHIMA UNIV,FAC ENGN,DEPT ELECT ENGN,HIROSHIMA 724,JAPAN
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1989年 / 28卷 / 05期
关键词：
D O I：
10.1143/JJAP.28.L862
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：L862 / L864
页数：3
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