RF MAGNETRON SPUTTERING OF THICK PLATINUM COATINGS ON GLASS MICROSPHERES

被引：9
|
作者：
MEYER, SF
HSIEH, EJ
BURT, RJ
机构：
来源：
THIN SOLID FILMS | 1980年 / 72卷 / 02期
关键词：
Lasers; -; Sputtering;
D O I：
10.1016/0040-6090(80)90020-6
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A method is demonstrated for batch coating microspheres with a smooth uniform layer of platinum of micron thicknesses. The essential ingredients in the process include low pressure r. f. magnetron sputtering, oxygen doping of the sputtering gas and confining the microspheres in a water-cooled vibrating screened cage which can be biased. The oxygen doping refines the grain size for a smoother surface finish and alters the plasma to reduce the microsphere sticking for a more uniform coating.
引用
收藏
页码：373 / 378
页数：6
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