INTERDIFFUSION BETWEEN SOME REFRACTORY-METAL SILICIDES AND GAAS

被引：1
|
作者：
OSVALD, J [1 ]
SANDRIK, R [1 ]
机构：
[1] DUBNA JOINT NUCL RES INST, NEUTRON PHYS LAB, DUBNA, USSR
来源：
THIN SOLID FILMS | 1989年 / 169卷 / 02期
关键词：
D O I：
10.1016/0040-6090(89)90704-9
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：223 / 228
页数：6
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