LASER ANNEALING OF DIFFUSION-INDUCED IMPERFECTIONS IN SILICON

被引：29
|
作者：
YOUNG, RT
NARAYAN, J
机构：
来源：
APPLIED PHYSICS LETTERS | 1978年 / 33卷 / 01期
关键词：
D O I：
10.1063/1.90164
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：14 / 16
页数：3
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