ToF-SIMS analysis of influence of alkylamine compounds in UPW on hydrogen-terminated Si surface

被引：0
|
作者：
Kobayashi, Junji [1 ,2 ]
Owari, Masanori [3 ]
机构：
[1] Mitsubishi Electr Corp, Adv Technol R&D Ctr, Tsukaguchi Hommachi 8-1-1, Amagasaki, Hyogo 6618661, Japan
[2] Univ Tokyo, Inst Ind Sci, Meguro Ku, Tokyo 1538505, Japan
[3] Univ Tokyo, Environm Sci Ctr, Bunkyo Ku, Tokyo 113003, Japan
来源：
E-JOURNAL OF SURFACE SCIENCE AND NANOTECHNOLOGY | 2006年 / 4卷
关键词：
Secondary ion mass spectrometry; Surface chemical reaction; Silicon; Si(100); Amine; ToF-SIMS;
D O I：
10.1380/ejssnt.2006.644
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Adsorption behaviors of alkylamine compounds in UPW (ultra pure water) on hydrogen-terminated Si(100) were elucidated mainly by ToF-SIMS. Si wafers cleaned by heat treatment in 500 degrees C were etched in 0.38% HF and soaked in water solution of alkylamine after 1 min UPW rinse. The peak intensity of amine molecular ions and SiH/Si ratio detected by ToF-SIMS are considered to be used as a measure of quantity of adsorbed molecules and surface oxidation, respectively. It was found that hydrophobic amine molecules with longer CH2 chain tend to be left with high concentration in a very short time of soaking and also tend to have the larger effect on the increase of surface oxidation of hydrogen-terminated surface. The latter phenomenon was explained by an I-effect of alkyl group.
引用
收藏
页码：644 / 649
页数：6
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