SOLID-STATE REACTIONS AND PHASE-RELATIONS IN THE TI-SI-O SYSTEM AT 1373 K

被引：41

作者：

GOLDSTEIN, JI ^{[1
]}

CHOI, SK ^{[1
]}

VANLOO, FJJ ^{[1
]}

BASTIN, GF ^{[1
]}

METSELAAR, R ^{[1
]}

机构：

[1] EINDHOVEN UNIV TECHNOL,SOLID STATE CHEM & MAT SCI LAB,5600 MB EINDHOVEN,NETHERLANDS

来源：

JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1995年 / 78卷 / 02期

关键词：

D O I：

10.1111/j.1151-2916.1995.tb08802.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Reactions between Ti and SiO2 were studied at 1373 K (1100 degrees C) under vacuum conditions using planar diffusion couples. A method to correct for the presence of surface oxide was developed which led to improved oxygen measurements with the electron probe microanalyzer. An isothermal section through the Ti-Si-O phase diagram at 1373 K was determined using measured diffusion paths and phase compositions in equilibrated alloys. The experimentally determined isothermal section was compared to isothermal sections calculated using thermodynamic data. In addition the sequence of reaction layers formed in the diffusion couples is discussed in terms of thermodynamic activity diagrams.

引用

页码：313 / 322

页数：10

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