MICROSTRUCTURE OF BI2(SR,CA)3CU2OX/BI2SR2CUOY/BI2(SR,CA)3CU2OX TRILAYER FILMS FABRICATED BY ION-BEAM SPUTTERING

被引：8
|
作者：
SATOH, T
FUJITA, J
YOSHITAKE, T
IGARASHI, H
机构：
[1] Fundamental Research Laboratories, NEC Corporation, Tsukuba, 305
来源：
PHYSICA C | 1991年 / 183卷 / 4-6期
关键词：
D O I：
10.1016/0921-4534(91)90574-I
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The microstructure of Bi2(Sr,Ca)3Cu2Ox/Bi2Sr2CuOy/Bi2(Sr,Ca)3Cu2Ox (2212/2201/2212) trilayer films was studied by cross-sectional high-resolution transmission electron microscopy. The trilayer films were fabricated in situ by ion beam sputtering on polished (001) MgO substrates with a thin 2201 buffer layer. The buffer layers significantly improved the surface flatness of the trilayer films. The trilayer films had an epitaxial relationship and the c-axis preferred orientation normal to the substrate surface. The intermediate 2201 layer had a uniform thickness, and the 2212/2201 interfaces were extremely sharp. The results indicated that the epitaxial 2212/2201/2212 trilayer films were suitable for the fabrication of sandwich-type Josephson junctions.
引用
收藏
页码：286 / 292
页数：7
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