EFFECTS OF OXYGEN IN ION-BEAM SPUTTER DEPOSITION OF VANADIUM-OXIDE

被引:32
|
作者
CHAIN, EE [1 ]
机构
[1] LTV MISSILES & ELECTR GROUP, DIV MISSILES, DALLAS, TX 75265 USA
来源
关键词
D O I
10.1116/1.574510
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:1836 / 1839
页数:4
相关论文
共 50 条
  • [31] ION-BEAM DEPOSITION
    ARMOUR, DG
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1994, 89 (1-4): : 325 - 331
  • [32] On the Growth of Stannic Oxide by Ion Beam Sputter Deposition (IBSD)
    Becker, Martin
    Polity, Angelika
    Klar, Peter J.
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2018, 215 (01):
  • [33] HYDROGEN-FREE SIN FILMS PREPARED BY ION-BEAM SPUTTER DEPOSITION
    KITABATAKE, M
    WASA, K
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04): : 1793 - 1794
  • [34] STUDY OF ANGULAR FACTORS IN SPUTTER-DEPOSITION USING THE ION-BEAM METHOD
    MOTOHIRO, T
    TAGA, Y
    NAKAJIMA, K
    SURFACE SCIENCE, 1982, 118 (1-2) : 66 - 74
  • [35] ION-BEAM SPUTTER DEPOSITION OF MOLYBDENUM CONTACTS FOR SCHOTTKY-BARRIER DIODES
    BOJARCZUK, NA
    PAZ, O
    AURET, FD
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (02): : 615 - 617
  • [36] Heteroepitaxial growth of TiO2 films by ion-beam sputter deposition
    Hotsenpiller, PAM
    Wilson, GA
    Roshko, A
    Rothman, JB
    Rohrer, GS
    JOURNAL OF CRYSTAL GROWTH, 1996, 166 (1-4) : 779 - 785
  • [37] ELECTRON TRAPPING CHARACTERISTICS OF MOS CAPACITORS PRODUCED BY ION-BEAM SPUTTER DEPOSITION
    BOJARCZUK, NA
    PETROSKI, M
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03): : 876 - 877
  • [38] OXYGEN ION-BEAM ASSISTED THIN-FILM DEPOSITION
    PUCKETT, R
    STELMACK, L
    MICHEL, S
    OCONNELL, MJ
    NATISHAN, P
    SURFACE & COATINGS TECHNOLOGY, 1990, 41 (03): : 259 - 267
  • [39] SI-TA-BASED COMPLEX-OXIDE FILMS PREPARED BY REACTIVE ION-BEAM SPUTTER DEPOSITION TECHNIQUE
    MASAKI, S
    YAMASAKI, J
    MORISAKI, H
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (11) : C625 - C625
  • [40] Properties of Indium Tin Oxide Thin Films Deposited on Glass and Clay Substrates by Ion-Beam Sputter Deposition Method
    Venkatachalam, Shanmugam
    Nanjo, Hiroshi
    Hassan, Fathy M. B.
    Kawasaki, Kazunori
    Wakui, Yoshito
    Hayashi, Hiromichi
    Ebina, Takeo
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2011, 50 (01)