PHOTOLUMINESCENCE AND DIFFUSIVITY OF FREE-EXCITONS IN DOPED SILICON

被引:9
|
作者
CHEN, YH [1 ]
LYON, SA [1 ]
机构
[1] PRINCETON UNIV,DEPT ELECT ENGN,PRINCETON,NJ 08544
关键词
7;
D O I
10.1109/3.27999
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:1053 / 1055
页数:3
相关论文
共 50 条
  • [1] CAPTURE OF FREE-EXCITONS BY PHOSPHORUS AND BORON IN BILAYERED SILICON-CRYSTALS
    NAKAMURA, M
    SUZUKI, T
    FUJITA, M
    PHYSICAL REVIEW B, 1987, 35 (06): : 2854 - 2862
  • [2] DRIFT AND DIFFUSION OF FREE-EXCITONS IN SI
    TAMOR, MA
    WOLFE, JP
    PHYSICAL REVIEW LETTERS, 1980, 44 (25) : 1703 - 1706
  • [3] IMPURITY AND FREE-EXCITONS IN ZINC DIARSENIDE
    SOBOLEV, VV
    KOZLOV, AI
    MARENKIN, SF
    SOKOLOVSKII, KA
    INORGANIC MATERIALS, 1985, 21 (08) : 1120 - 1122
  • [4] PHOTOLUMINESCENCE AND THERMAL QUENCHING OF FREE-EXCITONS UNDER NORMAL PRESSURE IN GAP-N
    DOU, K
    ZHANG, XY
    HONG, Q
    JOURNAL OF LUMINESCENCE, 1988, 40-1 : 487 - 488
  • [5] PICOSECOND SPECTROSCOPY OF FREE-EXCITONS IN GASE
    ALLAKHVERDIEV, K
    RINE, J
    MUSTAFAEV, N
    TAGIEV, M
    TATHAM, M
    FIZIKA TVERDOGO TELA, 1990, 32 (11): : 3334 - 3337
  • [6] RELAXATION OF THE MOMENTUM OF FREE-EXCITONS IN SEMICONDUCTORS
    ZINOVEV, NN
    IVANOV, LP
    LANG, IG
    PAVLOV, ST
    PROKAZNIKOV, AV
    YAROSHETSKII, ID
    JETP LETTERS, 1982, 36 (01) : 14 - 17
  • [7] SPECTROSCOPIC CRITERIA FOR ESTIMATING THE LIFETIME OF FREE-EXCITONS
    TRAVNIKOV, VV
    KRIVOLAPCHUK, VV
    SOVIET PHYSICS SEMICONDUCTORS-USSR, 1985, 19 (06): : 670 - 674
  • [8] OBSERVATION OF FREE-EXCITONS IN ROOM-TEMPERATURE PHOTOLUMINESCENCE OF GAAS/ALGAAS SINGLE QUANTUM WELLS
    FUJIWARA, K
    TSUKADA, N
    NAKAYAMA, T
    APPLIED PHYSICS LETTERS, 1988, 53 (08) : 675 - 677
  • [9] GIANT OSCILLATOR STRENGTH OF FREE-EXCITONS IN GAAS
    THOOFT, GW
    VANDERPOEL, WAJA
    MOLENKAMP, LW
    FOXON, CT
    PHYSICAL REVIEW B, 1987, 35 (15): : 8281 - 8284
  • [10] FREE-EXCITONS IN THE BLACK MODIFICATION OF ZINC DIPHOSPHIDE
    SYRBU, NN
    MAMAEV, VM
    SOVIET PHYSICS SEMICONDUCTORS-USSR, 1983, 17 (04): : 433 - 435