CHEMICAL MODIFICATION OF THE ELECTRICAL-PROPERTIES OF HYDROGENATED AMORPHOUS-CARBON FILMS

被引:85
|
作者
MEYERSON, B
SMITH, FW
机构
关键词
D O I
10.1016/0038-1098(80)90144-1
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
引用
下载
收藏
页码:531 / 534
页数:4
相关论文
共 50 条
  • [41] ELECTRICAL-PROPERTIES OF CARBON-DOPED AMORPHOUS BORON FILMS
    FELDMAN, C
    CHARLES, HK
    SATKIEWICZ, FG
    BOHANDY, J
    JOURNAL OF THE LESS-COMMON METALS, 1976, 47 (JUN): : 141 - 145
  • [42] HYDROGENATED AMORPHOUS-CARBON FILMS PREPARED BY PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION
    CHOU, LH
    JOURNAL OF APPLIED PHYSICS, 1992, 72 (05) : 2027 - 2035
  • [43] Nitrogen modification of hydrogenated amorphous carbon films
    Silva, SRP
    Robertson, J
    Amaratunga, GAJ
    Rafferty, B
    Brown, LM
    Schwan, J
    Franceschini, DF
    Mariotto, G
    JOURNAL OF APPLIED PHYSICS, 1997, 81 (06) : 2626 - 2634
  • [44] ELECTRICAL-PROPERTIES OF AMORPHOUS SNCO FILMS
    KORN, D
    PHYSICS LETTERS A, 1985, 108 (04) : 215 - 216
  • [45] MICROSCOPIC STRUCTURE OF HYDROGENATED AMORPHOUS-CARBON
    IARLORI, S
    GALLI, G
    MARTINI, O
    PHYSICAL REVIEW B, 1994, 49 (10) : 7060 - 7063
  • [46] ELECTRICAL-PROPERTIES OF HYDROGENATED AMORPHOUS SI1-XGEX THIN-FILMS
    PISARKIEWICZ, T
    STAPINSKI, T
    KOLODZIEJ, A
    ACTA PHYSICA POLONICA A, 1991, 79 (2-3) : 203 - 206
  • [47] ELECTRICAL AND PHOTOELECTRICAL CHARACTERISTICS OF HETEROSTRUCTURES WITH AMORPHOUS-CARBON FILMS
    POLYAKOV, VI
    PEROV, PI
    ERMAKOV, MG
    ERMAKOVA, ON
    ELINSON, VM
    SLEPTSOV, VV
    THIN SOLID FILMS, 1992, 212 (1-2) : 226 - 231
  • [48] THE MICROSTRUCTURAL STUDIES OF HYDROGENATED AMORPHOUS-CARBON FILMS BY RAMAN-SPECTRA
    CHENG, GX
    GU, SL
    HE, YL
    WANG, ZH
    XIA, H
    ZHANG, W
    ZHANG, XK
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 1993, 139 (02): : 459 - 469
  • [49] Electrical Conduction Properties of Hydrogenated Amorphous Carbon Films with Different Structures
    Tomidokoro, Masashi
    Tunmee, Sarayut
    Rittihong, Ukit
    Euaruksakul, Chanan
    Supruangnet, Ratchadaporn
    Nakajima, Hideki
    Hirata, Yuki
    Ohtake, Naoto
    Akasaka, Hiroki
    MATERIALS, 2021, 14 (09)
  • [50] Effects of deposition temperature on electrical properties of hydrogenated amorphous carbon films
    Cheng, SH
    Ning, ZY
    Kan, J
    Ma, CL
    Ye, C
    ACTA PHYSICA SINICA, 2000, 49 (10) : 2041 - 2046