INTERPRETATION AND CONTROL OF C-V MEASUREMENTS USING PATTERN-RECOGNITION AND EXPERT SYSTEM TECHNIQUES

被引：4
|
作者：
WALLS, JA
WALTON, AJ
ROBERTSON, JM
机构：
[1] Digital Equipment Scotland, Ltd., Headrig Road, South Queensferry
[2] Edinburgh Microfabrication Facility, Department of Electrical Engineering, The Kings’ Buildings, Mayfield Road, Edinburgh
来源：
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING | 1991年 / 4卷 / 03期
关键词：
D O I：
10.1109/66.85947
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Pattern-recognition and knowledge-based techniques have been applied to help extract the maximum amount of information from C-V measurements. This has been implemented by integrating conventional, algorithmic instrument control software with an expert system shell to intelligently sequence tests to enhance conventional CV, GV, C-t, and QSCV measurements. This approach ensures that the measurement sequence is appropriately tailored to the particular characteristics of the MOS capacitor test structure under investigation.
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页码：250 / 262
页数：13
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