HIGH-TEMPERATURE STABILITY OF SI/SIO2 INTERFACES AND THE INFLUENCE OF SIO FLUX ON THERMOMIGRATION OF IMPURITIES IN SIO2

被引：14
|
作者：
CELLER, GK
TRIMBLE, LE
机构：
来源：
APPLIED PHYSICS LETTERS | 1988年 / 53卷 / 25期
关键词：
D O I：
10.1063/1.100527
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：2492 / 2494
页数：3
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