DISSOCIATIVE PHOTOIONIZATION OF SIH4 IN THE 12-19 EV REGION

被引:18
|
作者
HAYAISHI, T [1 ]
KOIZUMI, T [1 ]
MATSUO, T [1 ]
NAGATA, T [1 ]
SATO, Y [1 ]
SHIBATA, H [1 ]
YAGISHITA, A [1 ]
机构
[1] NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,OHO,IBARAKI 305,JAPAN
关键词
D O I
10.1016/0301-0104(87)80077-0
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
引用
收藏
页码:151 / 157
页数:7
相关论文
共 50 条
  • [11] TRANSLATIONALLY ACTIVATED DISSOCIATIVE CHEMISORPTION OF SIH4 ON THE SI(100) AND SI(111) SURFACES
    JONES, ME
    XIA, LQ
    MAITY, N
    ENGSTROM, JR
    CHEMICAL PHYSICS LETTERS, 1994, 229 (4-5) : 401 - 407
  • [12] Experimental study of photoionization of ozone in the 12 to 21 eV region
    Mocellin, A
    Wiesner, K
    Burmeister, F
    Björneholm, O
    de Brito, AN
    JOURNAL OF CHEMICAL PHYSICS, 2001, 115 (11): : 5041 - 5046
  • [13] EMISSIONS OF FRAGMENTS FORMED DURING DISSOCIATIVE EXCITATION OF SIH4 MOLECULES BY ELECTRON-IMPACT
    KISHKO, SM
    SUSHANIN, IV
    FELTSAN, PV
    HIGH ENERGY CHEMISTRY, 1990, 24 (06) : 477 - 478
  • [14] DISSOCIATIVE EXCITATION OF SIH4, SID4, SI2H6 AND GEH4 BY 0-100 EV ELECTRON-IMPACT
    PERRIN, J
    AARTS, JFM
    CHEMICAL PHYSICS, 1983, 80 (03) : 351 - 365
  • [15] Dissociative photoionization of CH3SSCH3 in the region of ∼8-25 eV
    Chiang, SY
    Ma, CI
    Shr, DJ
    JOURNAL OF CHEMICAL PHYSICS, 1999, 110 (18): : 9056 - 9063
  • [16] DISSOCIATIVE EXCITATION OF SIH4 BY ELECTRON-IMPACT - EMISSION CROSS-SECTIONS FOR FRAGMENT SPECIES
    TSURUBUCHI, S
    MOTOHASHI, K
    MATSUOKA, S
    ARIKAWA, T
    CHEMICAL PHYSICS, 1992, 161 (03) : 493 - 500
  • [17] DFT study on dissociative adsorption of SiH4 and GeH4 on SiGe(100)-2 x 1 surface
    Cheng, Chia-Liang
    Tsai, Dah-Shyang
    Jiang, Jyh-Chiang
    SURFACE SCIENCE, 2006, 600 (16) : 3194 - 3201
  • [18] DISSOCIATIVE EXCITATION OF SIH4 BY ELECTRON-IMPACT - EMISSION CROSS-SECTIONS FOR THE HYDROGEN LYMAN SERIES
    TSURUBUCHI, S
    MOTOHASHI, K
    MATSUOKA, S
    ARIKAWA, T
    CHEMICAL PHYSICS, 1991, 155 (03) : 401 - 406
  • [19] Negative ion formation through dissociative electron attachment to GeH4: Comparative studies with CH4 and SiH4
    Hoshino, M.
    Matejcik, S.
    Nunes, Y.
    Ferreira da Silva, F.
    Limao-Vieira, P.
    Tanaka, H.
    INTERNATIONAL JOURNAL OF MASS SPECTROMETRY, 2011, 306 (01) : 51 - 56
  • [20] Dissociative photoionization of H-2 and D-2 in the energy region of 25-45 eV
    Ito, K
    Hall, RI
    Ukai, M
    JOURNAL OF CHEMICAL PHYSICS, 1996, 104 (21): : 8449 - 8457