ELECTRON-BEAM LITHOGRAPHY

被引:0
|
作者
EVERHART, TE [1 ]
机构
[1] UNIV CALIF BERKELEY,BERKELEY,CA 94720
来源
BULLETIN OF THE AMERICAN PHYSICAL SOCIETY | 1977年 / 22卷 / 03期
关键词
D O I
暂无
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
引用
收藏
页码:276 / 276
页数:1
相关论文
共 50 条
  • [31] RETICLE GENERATION BY ELECTRON-BEAM LITHOGRAPHY
    BERRIAN, DW
    DOHERTY, JA
    HORVATH, EC
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1814 - 1814
  • [32] RESOLUTION LIMITS FOR ELECTRON-BEAM LITHOGRAPHY
    BROERS, AN
    IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1988, 32 (04) : 502 - 513
  • [33] ELECTRON-BEAM LITHOGRAPHY: AN OVERVIEW.
    Iida, Yasuo
    Japan Annual Reviews in Electronics, Computers & Telecommunications, 1984, 13 : 287 - 302
  • [34] Contrast limitations in electron-beam lithography
    Crandall, R
    Hofmann, U
    Lozes, RL
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999, 17 (06): : 2945 - 2947
  • [35] PROXIMITY EFFECT IN ELECTRON-BEAM LITHOGRAPHY
    CHANG, THP
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1271 - 1275
  • [36] ELECTRON-BEAM LITHOGRAPHY FOR SMALL MOSFETS
    WATTS, RK
    FICHTNER, W
    FULS, EN
    THIBAULT, LR
    JOHNSTON, RL
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1981, 28 (11) : 1338 - 1345
  • [37] DOT MATRIX ELECTRON-BEAM LITHOGRAPHY
    NEWMAN, TH
    PEASE, RFW
    DEVORE, W
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04): : 999 - 1002
  • [38] THERMAL EFFECTS IN ELECTRON-BEAM LITHOGRAPHY
    MULDER, EH
    VANDERMAST, KD
    ENTERS, AC
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (06): : 1552 - 1555
  • [39] WORKPIECE CHARGING IN ELECTRON-BEAM LITHOGRAPHY
    INGINO, J
    OWEN, G
    BERGLUND, CN
    BROWNING, R
    PEASE, RFW
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (03): : 1367 - 1371
  • [40] ALIGNMENT SIGNALS FOR ELECTRON-BEAM LITHOGRAPHY
    LIN, YC
    NEUREUTHER, AR
    SOLID STATE TECHNOLOGY, 1984, 27 (02) : 117 - 122