Deep-Cryogenic Voltage References in 40-nm CMOS

被引:27
|
作者
Homulle, Harald [1 ]
Sebastiano, Fabio [1 ]
Charbon, Edoardo [2 ]
机构
[1] Delft Univ Technol, QuTech, NL-2628 CD Delft, Netherlands
[2] Ecole Polytech Fed Lausanne, AQUA, CH-1015 Lausanne, Switzerland
来源
IEEE SOLID-STATE CIRCUITS LETTERS | 2018年 / 1卷 / 05期
关键词
Bandgap; cryogenic; MOS; voltage reference;
D O I
10.1109/LSSC.2018.2875821
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
The increasing interest in electronics specifically designed to control quantum processors is currently driven by the quest for large-scale quantum computing. A promising approach is emerging based on the use of CMOS devices operating at deep-cryogenic temperatures, and several essential components have been demonstrated to operate at such temperatures, from basic MOSFETs to field-programmable gate arrays. In this letter, we show, for the first time, a voltage reference in a standard CMOS technology that can guarantee a stable voltage over a wide range of temperatures from 300 K down to deep-cryogenic temperatures. By exploiting CMOS transistors in dynamic-threshold MOS configuration, the proposed reference occupies only 445 mu m(2) in a standard 40-nm CMOS process, while showing a temperature coefficient below 0.8 mV/K over the temperature range from 4 to 300 K. These results demonstrate the feasibility of wide-range cryogenic voltage references to enable future cryogenic applications.
引用
收藏
页码:110 / 113
页数:4
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