GE-DOPED SI3N4 FILM

被引：2
|
作者：
TAMAKI, Y
ISOMAE, S
SHINTANI, A
MAKI, M
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1979年 / 126卷 / 12期
关键词：
D O I：
10.1149/1.2128943
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：2271 / 2273
页数：3
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