A NEW ANALYTICAL MODEL FOR SPIN COATING PROCESS WITH SOLVENT EVAPORATION

被引：15
|
作者：
SHIMOJI, S
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1987年 / 26卷 / 06期
关键词：
D O I：
10.1143/JJAP.26.L905
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：L905 / L907
页数：3
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