METALLIC IMPURITIES DETERMINATION IN HIGH-PURITY INDIAN BY ATOMIC-EMISSION SPECTROMETRY IN INDUCTIVELY-COUPLED PLASMA

被引：0
|
作者：
GHINERARU, M
MOLDOVEANU, M
机构：
来源：
REVISTA DE CHIMIE | 1995年 / 46卷 / 08期
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D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
The paper presents a rapid and efficient method for the determination of some impurities (i.e. Ag, Al, As, Cd, Cu, Fe, Ni, Pb, Sn, Te, Zn) in the high purity metallic indium used in the synthesis of some A(III) B(V)-type semiconductor compounds. The determinations were performed by atomic emission spectrography in the inductively couple plasma (ICP-AES).
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页码：769 / 772
页数：4
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