VAPOR DEPOSITION OF TUNGSTEN BY HYDROGEN REDUCTION OF TUNGSTEN HEXAFLUORIDE - PROCESS VARIABLES AND PROPERTIES OF DEPOSIT

被引：22
|
作者：
BERKELEY, JF
BRENNER, A
REID, WE
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1967年 / 114卷 / 06期
关键词：
D O I：
10.1149/1.2426649
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：561 / &
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