ION-IMPLANTED N-TYPE RESISTORS ON HIGH-RESISTIVITY SUBSTRATES

被引:3
|
作者
HANSON, JW [1 ]
HUBER, RJ [1 ]
FORDEMWALT, JN [1 ]
机构
[1] UNIV UTAH, INST BIOMED ENGN, SALT LAKE CITY, UT 84112 USA
来源
关键词
D O I
10.1116/1.1318521
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:944 / 947
页数:4
相关论文
共 50 条
  • [1] ION-IMPLANTED PARA-TYPE HIGH-RESISTIVITY LAYERS WITH HIGH-TEMPERATURE TREATMENT
    KASSABOV, JD
    VOUTOV, MP
    VELCHEV, NB
    PETROV, IN
    [J]. DOKLADI NA BOLGARSKATA AKADEMIYA NA NAUKITE, 1976, 29 (04): : 481 - 483
  • [2] ION-IMPLANTED N-TYPE DIAMOND - ELECTRICAL EVIDENCE
    PRINS, JF
    [J]. DIAMOND AND RELATED MATERIALS, 1995, 4 (5-6) : 580 - 585
  • [3] QUENCHING OF PHOTOCONDUCTIVITY OF HIGH-RESISTIVITY N-TYPE INP
    BERKELIEV, A
    DURDYEV, K
    [J]. SOVIET PHYSICS SEMICONDUCTORS-USSR, 1972, 6 (03): : 458 - +
  • [4] ACHIEVEMENT OF HIGH-QUALITY GAAS N-TYPE ION-IMPLANTED LAYER
    LUO, JS
    CHEN, TS
    [J]. ADVANCES IN MATERIALS, PROCESSING AND DEVICES IN III-V COMPOUND SEMICONDUCTORS, 1989, 144 : 415 - 419
  • [5] ION-IMPLANTED N-TYPE AND P-TYPE LAYERS IN INPA
    DONNELLY, JP
    HURWITZ, CE
    [J]. APPLIED PHYSICS LETTERS, 1977, 31 (07) : 418 - 420
  • [6] On the diffusion and activation of ion-implanted n-type dopants in germanium
    Simoen, Eddy
    Vanhellemont, Jan
    [J]. JOURNAL OF APPLIED PHYSICS, 2009, 106 (10)
  • [7] N-Type, Ion-Implanted Silicon Solar Cells and Modules
    Meier, Daniel L.
    Chandrasekaran, Vinodh
    Davis, H. Preston
    Payne, Adam M.
    Wang, Xiaoyan
    Yelundur, Vijay
    O'Neill, Jon E.
    Ok, Young-Woo
    Zimbardi, Francesco
    Rohatgi, Ajeet
    [J]. IEEE JOURNAL OF PHOTOVOLTAICS, 2011, 1 (02): : 123 - 129
  • [8] INVESTIGATION OF THERMAL DEFECTS IN HIGH-RESISTIVITY N-TYPE SI
    ASTROVA, EV
    VORONKOV, VB
    LEBEDEV, AA
    URUNBAEV, BM
    [J]. SOVIET PHYSICS SEMICONDUCTORS-USSR, 1985, 19 (09): : 1051 - 1052
  • [9] ANNEALING CHARACTERISTICS OF N-TYPE DOPANTS IN ION-IMPLANTED SILICON
    CROWDER, BL
    MOREHEAD, FF
    [J]. APPLIED PHYSICS LETTERS, 1969, 14 (10) : 313 - &
  • [10] On the diffusion and activation of ion-implanted n-type dopants in germanium
    Simoen, Eddy
    Vanhellemont, Jan
    [J]. Journal of Applied Physics, 2009, 106 (10):