RESIST MATERIALS FOR FINE LINE LITHOGRAPHY

被引：0
|
作者：
BOWDEN, MJ
THOMPSON, LF
机构：
来源：
SOLID STATE TECHNOLOGY | 1979年 / 22卷 / 05期
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：72 / 82
页数：11
相关论文
共 50 条
  • [1] A PERSPECTIVE ON RESIST MATERIALS FOR FINE-LINE LITHOGRAPHY
    BOWDEN, MJ
    [J]. ACS SYMPOSIUM SERIES, 1984, 266 : 39 - 117
  • [2] RESIST MATERIALS FOR FINE PATTERN LITHOGRAPHY
    YAMAMOTO, S
    [J]. DENKI KAGAKU, 1982, 50 (07): : 530 - 534
  • [3] Resist materials for advanced lithography
    Fedynyshyn, TH
    Sinta, RF
    Pottebaum, I
    Cabral, A
    [J]. Advances in Resist Technology and Processing XXII, Pt 1 and 2, 2005, 5753 : 281 - 291
  • [4] FINE LINE LITHOGRAPHY
    THOMPSON, LF
    [J]. SOLID STATE TECHNOLOGY, 1979, 22 (05) : 59 - 59
  • [5] Polymer resist materials for excimer ablation lithography
    Suzuki, K
    Matsuda, M
    Hayashi, N
    [J]. APPLIED SURFACE SCIENCE, 1998, 127 : 905 - 910
  • [6] Resist materials for 157-nm lithography
    Toriumi, M
    Ishikawa, S
    Miyoshi, S
    Naito, T
    Yamazaki, T
    Watanabe, M
    Itani, T
    [J]. ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVIII, PTS 1 AND 2, 2001, 4345 : 371 - 378
  • [7] APPLICATION OF ORGANIC RESIST MATERIALS IN SYNCHROTRON LITHOGRAPHY
    TRUBE, J
    HEUBERGER, A
    [J]. ANGEWANDTE MAKROMOLEKULARE CHEMIE, 1990, 183 : 123 - 132
  • [8] RESIST MATERIALS FOR ELECTRON-BEAM LITHOGRAPHY
    LAI, JH
    [J]. JOURNAL OF IMAGING TECHNOLOGY, 1985, 11 (04): : 164 - 167
  • [9] Resist Materials and Processes for Extreme Ultraviolet Lithography
    Itani, Toshiro
    Kozawa, Takahiro
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 2013, 52 (01)
  • [10] Evaluation of Novel Resist Materials for EUV Lithography
    Aratani, Ichihiro
    Matsunaga, Shuji
    Kajiyashiki, Tsuyoshi
    Watanabe, Takeo
    Kinoshita, Hiroo
    [J]. ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXVI, 2009, 7273
12345