A COMPACT ELECTRON-BEAM METAL VAPOR SOURCE WITH INTEGRAL COOLING AND SHUTTER

被引：8
|
作者：
TAYLOR, JSG
NEWSTEAD, DA
机构：
来源：
JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS | 1987年 / 20卷 / 10期
关键词：
ELECTRON BEAMS - Applications;
D O I：
10.1088/0022-3735/20/10/033
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
A simple compact ultra-high-vacuum (UHV) electron-beam evaporator, to deposit ultra-thin layers of low vapor pressure, high melting point transition metals is described. It has an integral cryoshield and shutter which will fit a UHV system with a standard 70 mm flange. The unit has reliably evaporated for 40 h and appears to have used less than 30 mg of sample.
引用
收藏
页码：1288 / 1289
页数：2
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